SSL/NUSNNI Seminar Series
2004 No.2
Combined talks (two speakers)
Date: April 26 (Monday), 2004
Time: 4:00-5:00pm
Venue: Physics Resource Room (Blk S13 # 02-16)
Speaker I: Mr. Chung Hong Jing
Title: Nanoscale fabrication using atomic force microscopy
probe induced oxidation
Abstract:
Atomic force microscope (AFM) probe induced oxidation process
is based on negatively biasing the tip with respect to the conductive
substrate. The possibility of such local oxidation is a promising
method for the nanolithography and nanofabrication of devices for
various applications. In this talk, we demonstrate that different
types of oxide feature can be fabricated including lines, complicated
polygon shapes, plain platforms, and also dots. The influence of
experiments parameters, such as tip bias voltage and tip scanning
velocity on the lateral and vertical growth of oxides are analyzed
throughout a series of experiments on n-type silicon (100). The
possible mechanism involved in the AFM probe induced localized anodic
oxidation are discussed.
Speaker II: Mr.Yong Kian Soon
Title: Nanopatterning of Silicon Surfaces
Abstract:
Scanning tunneling microscope (STM) was used to investigate the
formation of Cu nanostructures on the Si(111)-7?7 surface. Cu forms
clusters preferentially on the faulted halves of the 7?7 unit cells
and the modified surface was intended to be used as a template to
organize the growth of thiophene and phthalocyanine. It was shown
that thiophene adsorbs on the Cu clusters while leaving the Cu-uncovered
halves intact. Phthalocyanine, however, interacts with the Si dangling
bonds on the unfaulted halves and does not pattern according to
the ordered Cu clusters. Besides, the (2?n) surface structure formed
upon deposition of Ge on Si(100)-2?1 was also used as a template
to organize the positions of subsequently deposited molecule. The
adsorption of styrene on this (2?n) surface was investigated using
STM and it was found that a 1-D molecular nanostructure was formed
through the selective binding of styrene to the Ge=Ge dimer.
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